Stress in the components of a thin film silicon monoxide capacitor and its relationship to dielectric loss

Author:

Carpenter R.,Campbell D. S.

Publisher

Springer Science and Business Media LLC

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Reference33 articles.

1. R. W. Hoffman, ?Physics of Thin Films?, Vol. 3 edited by G. Hass and R. E. Thun (Academic Press, New York, 1966) p. 211.

2. G. Hass, J. Amer. Ceram. Soc. 33 (1950) 353.

3. G. Siddall, Vacuum 9 (1960) 274.

4. M. A. Novice, Brit. J. Appl. Phys. 13 (1962) 561.

5. Idem, Vacuum 14 (1964) 385.

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