Analysis of Processing Mechanism in Stealth Dicing of Ultra Thin Silicon Wafer

Author:

OHMURA Etsuji1,KUMAGAI Masayoshi2,NAKANO Makoto2,KUNO Koji2,FUKUMITSU Kenshi2,MORITA Hideki2

Affiliation:

1. Div. Materials and Manufacturing Science, Osaka University

2. Hamamatsu Photonics K.K.

Publisher

Japan Society of Mechanical Engineers

Subject

Industrial and Manufacturing Engineering,Mechanical Engineering

Reference11 articles.

1. [1] G. C. Lim, A. T. Mai, D. Low and Q. Chen: High Quality Laser Microcut-ting of Difficult-to-Cut Materials-Copper and Si Wafer, Proceedings of the 21st International Congress on Applications of Lasers and Electro-Optics, (2002).

2. [2] R. Ebutt, S. Danyluk and I. Weisshaus: Method to Evaluate Damage Induced by Dicing and Laser Cut-ting of Si Wafers, Microstructural Science, 23, (1996) 89.

3. [3] T. Ueda, K. Yamada, K. Oiso and A. Hosokawa: Thermal Stress Cleaving of Brittle Materials by Laser Beam, Annals of CIRP, 51/1, (2002) 149.

4. [4] Japanese Patent 3408805 and U.S.A. Patent 6992026 etc.

5. [5] F. Fukuyo, K. Fukumitsu and N. Uchiyama: The Stealth Dicing Technologies and Their Application, Proceedings of the 6th Laser Precision Micro-fabrication, (2005).

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