Effects of Bubbles on Manufacturing Gold Dendrites and Silicon Nanowires Through the Fluoride-Assisted Galvanic Replacement Reaction

Author:

Lee Pee-Yew1,Huang Hung Ji2,Ko Tsung-Shine3,Hung Ying-Lun4,Wu Li-Yan4,Fan Jia-Jun2,Lin Yung-Sheng4

Affiliation:

1. National Taiwan Ocean University Department of Optoelectronics and Materials Technology, , Keelung 202301 , Taiwan

2. National Formosa University Department of Electro-Optical Engineering, , Douliu 632301 , Taiwan

3. National Changhua University of Education Department of Electronic Engineering, , Changhua 50074 , Taiwan

4. National United University Department of Chemical Engineering, , Miaoli 360302 , Taiwan

Abstract

Abstract The fluoride-assisted galvanic replacement reaction is a conventional method for fabricating metallic dendrites on silicon wafers. However, whether bubbles affect manufacturing metallic dendrites is unclear. This study investigated the effects of bubbles on manufacturing Au dendrites and silicon nanowires through metal-assisted chemical etching. The results of manufacture under three conditions (standard, shaking, and vacuum conditions) were compared. Synchronous growth of Au dendrites and silicon nanowires were observed on the silicon wafers. The Au dendrite deposition rate was higher than the silicon etching rate. Compared with the standard condition, the vacuum condition increased the synthesis rates of Au dendrites and silicon nanowires by 1.1 and 0.2 μm/min, respectively. Therefore, the elimination of bubbles by vacuum can considerably accelerate manufacturing Au dendrites and silicon nanowires.

Publisher

ASME International

Subject

Industrial and Manufacturing Engineering,Computer Science Applications,Mechanical Engineering,Control and Systems Engineering

Reference21 articles.

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