Pressure Drop and Flow Development in the Entrance Region of Microchannels With Second-Order Velocity Slip Condition and the Requirement for Development Length

Author:

Ray Baibhab1,Durst Franz2,Ray Subhashis3

Affiliation:

1. Department of Physics, Technische Universität Dresden, Dresden 01069, Germany

2. FMP Technology GmbH, Am Weichselgarten 34, Erlangen 91058, Germany

3. Institute of Thermal Engineering, Technische Universität Bergakademie Freiberg, Gustav-Zeuner Straße 7, Freiberg 09596, Germany

Abstract

AbstractIn this investigation, Lfd* and Δp in the entrance region of circular and parallel plate microchannels have been determined for 10−2≤Re≤104 and 10−4≤Kn≤0.2, employing the second-order velocity slip condition at the wall with C1=1 and 0≤C2≤0.5. Results indicate that although local velocity slip at the wall is always higher than that for the fully developed section, local wall shear stress for higher Kn and C2 could be lower than its fully developed value, which is also more prominent for lower Re. Therefore, depending upon the operating condition, K(x) and Kfd could assume negative values, implying that pressure gradient in the developing region could even be less than that in the fully developed section. It has been further observed that both Lfd* and Kfd are characterized by the low and the high Re asymptotes, using which extremely accurate correlations have been proposed for both geometries.

Publisher

ASME International

Subject

Mechanical Engineering

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