The Future of Thermal Plasma Processing
Author:
Affiliation:
1. Department of Metallurgy, Faculty of Engineering, The University of Tokyo
Publisher
Japan Institute of Metals
Subject
General Engineering
Link
https://www.jstage.jst.go.jp/article/matertrans1989/31/1/31_1_1/_pdf
Reference13 articles.
1. 1) T. Yoshida and K. Akashi: J. Appl. Phys., 48 (1977), 2252.
2. 2) T. Harada, T. Yoshida, T. Koseki and K. Akashi: J. Japan Inst. Metals, 45 (1981), 1138.
3. 3) Y. Anekawa, T. Koseki, T. Yoshida and K. Akashi: J. Japan Inst. Metals, 49 (1985), 451.
4. 4) T. Yoshida, A. Kawasaki, K. Nakagawa and K. Akashi: J. Mater. Sci., 14 (1979), 1624.
5. 5) T. Yoshida, T. Tani, H. Nishimura and K. Akashi: J. Appl. Phys., 54 (1983), 640.
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