Influence of Crystallographic Structure on Etching Rate of Copper by Using Ammonium Peroxodisulfate Solution
Author:
Publisher
Japan Institute of Electronics Packaging
Subject
Electrical and Electronic Engineering
Link
https://www.jstage.jst.go.jp/article/jiep/15/3/15_197/_pdf
Reference14 articles.
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Microstructural characterization of copper coatings in development for application to used nuclear fuel containers;Journal of Nuclear Materials;2020-04
2. Influence of Cleaning and Soft Etching for Electroless Palladium/Gold Plating on Copper Fine Pattern;Journal of The Surface Finishing Society of Japan;2017-08-01
3. Influence of Crystalline Texture on Etching Rate of Copper by Use of Sulfuric Acid/Hydrogen Peroxide Etching Solution;Journal of The Japan Institute of Electronics Packaging;2013
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