Affiliation:
1. Autonetics Division of North American Rockwell Corporation, Anaheim, California
Abstract
Alternative visual systems for aligning successive circuit patterns in the fabrication of microelectronic devices were developed and evaluated. The experimental evaluation was conducted under both laboratory and production conditions. The study resulted in an optimal alignment mark system in terms of both alignment accuracy and speed.
Subject
Behavioral Neuroscience,Applied Psychology,Human Factors and Ergonomics
Cited by
4 articles.
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1. Human Factors in Industrial Systems: 40 Years On;Human Factors: The Journal of the Human Factors and Ergonomics Society;2008-06
2. Collimation testing with circular gratings;Applied Optics;2001-03-10
3. Über Die Justierung Ebener Strukturen Mittels Moiré;Optica Acta: International Journal of Optics;1976-01
4. Photolithographic Mask Alignment Using Moiré Techniques;Applied Optics;1972-11-01