Development of nanometer level accurate computer-controlled figuring with high spatial resolution and its application to hard X-ray focusing mirror
Author:
Publisher
Japan Society for Precision Engineering
Subject
Mechanical Engineering
Reference14 articles.
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3. Figuring with subnanometer-level accuracy by numerically controlled elastic emission machining
4. Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining
5. 5) A. Schindler, T. Haensel, D. Flamm, W. Frank, G. Boehm, F. Frost, R. Fechner, F. Bigl, and B. Rauschenbach, Ion beam and plasma jet etching for optical component fabrication, Proc. SPIE 4440 (2001) 217.
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Development of a numerically controlled elastic emission machining system for fabricating mandrels of ellipsoidal focusing mirrors used in soft x-ray microscopy;SPIE Proceedings;2013-09-27
2. New X-ray Optics Fields Created by Synchrotron Radiation and Advanced Optical Device;TRENDS IN THE SCIENCES;2010
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