Observation of Moving Nano-Particles in the Vicinity of a Substrate Wall Using Near Field Light (Evanescent Field)-Reference-Cited by-同舟云学术

Observation of Moving Nano-Particles in the Vicinity of a Substrate Wall Using Near Field Light (Evanescent Field)

Published:2024-02-05 Issue:2 Volume:90 Page:184-188
ISSN:0912-0289
Container-title:Journal of the Japan Society for Precision Engineering
language:en
Short-container-title:Journal of the Japan Society for Precision Engineering

Author:

KHAJORNRUNGRUANG Panart¹

Affiliation:

1. 九州工業大学

Publisher

Japan Society for Precision Engineering

Link

https://www.jstage.jst.go.jp/article/jjspe/90/2/90_184/_pdf

Reference20 articles.

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3. 3) K. Kimura, Y. Hashiyama, P. Khajornrungruang, H. Hiyama and Y. Mochizuki : Study on Material Removal Phenomena in CMP Process, Proc. ICPT 2007 (2007) 201.

4. 4) 森永均, 玉井一誠：CMPと洗浄における表面欠陥/ラフネス発生機構と対策, 精密工学会春季大会学術講演論文集C14 (2008) 195.

5. 5) H. Chew, D.S. Wang and M. Kerker : Elastic scattering of evanescent electromagnetic waves, Appl. Opt., 18 (1979) 2679.

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