Ultra-thin TiN/Ta/sub 2/O/sub 5W capacitor technology for 1 Gbit DRAM
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Publisher
IEEE
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http://xplorestaging.ieee.org/ielx2/1088/8045/00347401.pdf?arnumber=347401
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5. Electrical and Physical Characteristics of Ba(Zr0.1Ti0.9)O3 Thin Films under Oxygen Plasma Treatment for Nonvolatile Memory Devices Application;Key Engineering Materials;2008-02
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