Determination of wavelength and excitation voltage for X-ray lithography-Reference-Cited by-同舟云学术

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Determination of wavelength and excitation voltage for X-ray lithography

Published:1976-04 Issue:4 Volume:23 Page:412-418
ISSN:0018-9383
Container-title:IEEE Transactions on Electron Devices
language:
Short-container-title:IEEE Trans. Electron Devices

Author:

Sullivan P.A.,McCoy J.H.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx5/16/31749/01478432.pdf?arnumber=1478432

Cited by 22 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of preionization on soft x-ray emission and plasma dynamics in a small plasma focus system;Journal of Applied Physics;2010-04

2. Comparative study of soft x-ray emission characteristics in a low energy dense plasma focus device;Journal of Applied Physics;2004-03-15

3. The Physics of X-Ray Microlithography;The Physics of Submicron Lithography;1992

4. Wave reflection and hydraulic impedance in the healthy arterial system: a controversial subject;Medical & Biological Engineering & Computing;1988-05

5. Modern Developments in Soft X-Ray Imaging;Treatise on Materials Science & Technology;1988

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