Modeling of low-pressure deposition of SiO<inf>2</inf>by decomposition of TEOS-Reference-Cited by-同舟云学术

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Modeling of low-pressure deposition of SiO2by decomposition of TEOS

Published:1979-04 Issue:4 Volume:26 Page:658-662
ISSN:0018-9383
Container-title:IEEE Transactions on Electron Devices
language:
Short-container-title:IEEE Trans. Electron Devices

Author:

Huppertz H.,Engl W.L.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx5/16/31788/01480052.pdf?arnumber=1480052

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