Overview of 3D NAND Technologies and Outlook Invited Paper-Reference-Cited by-同舟云学术

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Overview of 3D NAND Technologies and Outlook Invited Paper

Published:2018-10 Issue: Volume: Page:
ISSN:
Container-title:2018 Non-Volatile Memory Technology Symposium (NVMTS)
language:
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Author:

Venkatesan Srinath,Aoulaiche Marc

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/8589963/8603098/08603104.pdf?arnumber=8603104

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Crystal Filter-Mediated Grain Alignment in Poly-Si Thin-Film Transistors for Next-Generation Ferroelectric Memory Devices;IEEE Electron Device Letters;2024-09

2. Unveiling polycrystalline silicon channel dissolution mechanism in wet etching process of 3D NAND fabrication;Surfaces and Interfaces;2024-07

3. Data Variability Study of Advanced 3D NAND Memory using Python;2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC);2024-05-13

4. Enhancement of ISPP Efficiency Using Neural Network-Based Optimization of 3-D NAND Cell;IEEE Transactions on Electron Devices;2023-07

5. Parallel Integration of Nanoscale Atomic Layer Deposited Ge₂Sb₂Te₅ Phase-Change Memory with an Indium Gallium Zinc Oxide Thin-Film Transistor;ACS Applied Electronic Materials;2023-03-06

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