Electron Beam-plasma Vacuum Deposition of Very Thin Carbon Films: Photocathode Application-Reference-Cited by-同舟云学术

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Electron Beam-plasma Vacuum Deposition of Very Thin Carbon Films: Photocathode Application

Published:2022-10-23 Issue: Volume: Page:
ISSN:
Container-title:2022 14th International Conference on Advanced Semiconductor Devices and Microsystems (ASDAM)
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Author:

Huran J.¹,Skrypnik A.V.¹,Dujnic V.¹,Doroshkevich A.S.¹,Zat'ko B.²,Nozdrin M.A.¹,Kovacova E.²,Shirkov G.D.³

Affiliation:

1. Joint Institute for Nuclear Research,Dubna,Moscow Region,Russian Federation,141980

2. Institute of Electrical Engineering, Slovak Academy of Sciences,Bratislava,Slovakia,84104

3. Institute of Chemistry, Slovak Academy of Sciences,Bratislava,Slovakia,84538

Funder

Slovak Research and Development Agency

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/9966729/9966739/09966777.pdf?arnumber=9966777

Reference6 articles.

1. Electron gun with a transmission photocathode for the Joint Institute for Nuclear Research photoinjector

2. Nanosized graphene sheets enhanced electron field emission behavior in pure carbon film

3. Very thin N-doped nanostructured carbon films on quartz and sapphire substrate: Photoelectron emission properties

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