Device scaling of high performance MOSFET with metal gate high-k at 32nm technology node and beyond-Reference-Cited by-同舟云学术

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Device scaling of high performance MOSFET with metal gate high-k at 32nm technology node and beyond

Published:2008-09 Issue: Volume: Page:
ISSN:
Container-title:2008 International Conference on Simulation of Semiconductor Processes and Devices
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Author:

Xinlin Wang ,Shahidi Ghavam,Oldiges Phil,Khare Mukesh

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx5/4636077/4648212/04648299.pdf?arnumber=4648299

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