Reliability of dual-damascene local interconnects featuring cobalt on 10 nm logic technology-Reference-Cited by-同舟云学术

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Reliability of dual-damascene local interconnects featuring cobalt on 10 nm logic technology

Published:2018-03 Issue: Volume: Page:
ISSN:
Container-title:2018 IEEE International Reliability Physics Symposium (IRPS)
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Author:

Griggio F.,Palmer J.,Pan F.,Toledo N.,Schmitz A.,Tsameret I.,Kasim R.,Leatherman G.,Hicks J.,Madhavan A.,Shin J.,Steigerwald J.,Yeoh A.,Auth C.

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/8345372/8353529/08353641.pdf?arnumber=8353641

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