Evaluation of Process Damage to Crystalline Silicon by Transparent Conductive Oxide Film Deposition-Reference-Cited by-同舟云学术

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Evaluation of Process Damage to Crystalline Silicon by Transparent Conductive Oxide Film Deposition

Published:2023-06-11 Issue: Volume: Page:
ISSN:
Container-title:2023 IEEE 50th Photovoltaic Specialists Conference (PVSC)
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Author:

Kojima Haruki¹,Nishihara Tappei¹,Ito Yuta¹,Lee Hyunju¹,Gotoh Kazuhiro²,Usami Noritaka²,Hara Tomohiko³,Nakamura Kyotaro³,Ohsita Yoshio³,Ogura Atsushi¹

Affiliation:

1. Meiji University, Scholl of Science and Technology,Kawasaki,Kanagawa,Japan,214-8571

2. Nagoya University,Nagoya,Aichi,Japan,464-8601

3. Toyota Technological Institute,Nagoya,Aichi,Japan,468-8511

Funder

New Energy and Industrial Technology Development Organization (NEDO)

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/10359507/10359504/10359745.pdf?arnumber=10359745

Reference10 articles.

1. Development of New a-Si/c-Si Heterojunction Solar Cells: ACJ-HIT (Artificially Constructed Junction-Heterojunction with Intrinsic Thin-Layer)

2. High-efficiency Silicon Heterojunction Solar Cells: A Review

3. Lifetime Degradation by Oxygen Precipitation Combined with Metal Contamination in Czochralski Silicon for Solar Cells

4. Evaluation of Process Damage Induced by Sputtering of Transparent Conductive Oxide Films for Crystalline Silicon Solar Cells

5. Damage at hydrogenated amorphous/crystalline silicon interfaces by indium tin oxide overlayer sputtering

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