Lanthanum-Oxide-Doped Nitride Charge-Trap Layer for a TANOS Memory Device-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Lanthanum-Oxide-Doped Nitride Charge-Trap Layer for a TANOS Memory Device

Published:2011-10 Issue:10 Volume:58 Page:3314-3320
ISSN:0018-9383
Container-title:IEEE Transactions on Electron Devices
language:
Short-container-title:IEEE Trans. Electron Devices

Author:

Park Jong Kyung,Park Youngmin,Lee Seok-Hee,Im Sung Kyu,Oh Jae Sub,Joo Moon Sig,Hong Kwon,Cho Byung Jin

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx5/16/6022820/05983430.pdf?arnumber=5983430

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Dual-Mechanism Memory Combining Charge Trapping and Polarization Switching for Wide Memory Window Flash Cell;IEEE Electron Device Letters;2023-07

2. Charge trapping NVMs with metal oxides in the memory stack;Metal Oxides for Non-volatile Memory;2022

3. Process effect analysis on nitride trap distribution in silicon-oxide-nitride-oxide-silicon flash memory based on charge retention model;Materials Express;2021-09-01

4. Materials and Device Reliability in SONOS Memories;Charge-Trapping Non-Volatile Memories;2017

5. Investigation of Charge Relaxation in Silicon Nitride for the Reliability of Electrostatically Driven Capacitive MEMS Devices;IEEE Transactions on Electron Devices;2014-08

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP