Continuing Moore's law with EUV lithography
Author:
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/8255107/8268301/08268390.pdf?arnumber=8268390
Cited by 13 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Monolithic three-dimensional integration of complementary two-dimensional field-effect transistors;Nature Nanotechnology;2024-07
2. Thermal and hydrodynamic characteristics of single-phase flow in manifold microchannels with countercurrent regions;International Journal of Heat and Mass Transfer;2023-09
3. Coarse-Grained Modeling of EUV Patterning Process Reflecting Photochemical Reactions and Chain Conformations;Polymers;2023-04-22
4. Extreme ultraviolet metalens by vacuum guiding;Science;2023-04-07
5. A study of hydrogen plasma-induced charging effect in EUV lithography systems;Discover Nano;2023-02-23
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