Review of Micro- and Nanoprobe Metrology for Direct Electrical Measurements on Product Wafers-Reference-Cited by-同舟云学术

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Review of Micro- and Nanoprobe Metrology for Direct Electrical Measurements on Product Wafers

Published:2022-06-20 Issue: Volume: Page:
ISSN:
Container-title:2022 China Semiconductor Technology International Conference (CSTIC)
language:
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Author:

Guralnik Benny¹,Nielsen Peter F.¹,Petersen Dirch H.²,Hansen Ole²,Shiv Lior¹,Wei Wilson¹,Marangoni Thomas A.²,Buron Jonas D.¹,Osterberg Frederik W.¹,Lin Rong¹,Henrichsen Henrik H.¹,Hansen Mikkel F.¹

Affiliation:

1. CAPRES - a KLA company,Kgs. Lyngby,Denmark,2800

2. Technical University of Denmark,Kgs. Lyngby,Denmark,2800

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/9856647/9856709/09856824.pdf?arnumber=9856824

Reference19 articles.

1. A variable probe pitch micro-Hall effect method

2. Review of electrical characterization of ultra-shallow junctions with micro four-point probes

3. Micro-four-point probe Hall effect measurement method

4. Fast micro Hall effect measurements on small pads

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