Author:
Ku Y.H.,Lee S.K.,Kwong D.-L.,Lee C.O.,Yeargain J.R.
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Cited by
11 articles.
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1. Silicon Device Processing;Materials Science and Technology;2013-02-15
2. A novel double ion-implant (DII) Ti-salicide technology for high-performance sub-0.25-μm CMOS devices applications;IEEE Transactions on Electron Devices;2001
3. Silicides and ohmic contacts;Materials Chemistry and Physics;1998-02
4. Ion-beam mixed ultra-thin cobalt suicide (CoSi2) films by cobalt sputtering and rapid thermal annealing;Journal of Electronic Materials;1995-10
5. Implantation in the 1990s;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1991-04