Stitch-avoiding Global Routing for Multiple E-Beam Lithography-Reference-Cited by-同舟云学术

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Stitch-avoiding Global Routing for Multiple E-Beam Lithography

Published:2022-02 Issue: Volume: Page:
ISSN:
Container-title:2022 35th International Conference on VLSI Design and 2022 21st International Conference on Embedded Systems (VLSID)
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Author:

Saha Kritanta¹,Paul Sudipta²,Banerjee Pritha²,Sur-Kolay Susmita¹

Affiliation:

1. Advanced Computing and Microelectronics Unit, Indian Statistical Institute,Kolkata,India

2. University of Calcutta,Department of Computer Science and Engineering,Kolkata,India

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/9885796/9885734/09885920.pdf?arnumber=9885920

Reference11 articles.

1. Faraday benchmarks;ICCAD,2004

2. Post-Layout Perturbation towards Stitch Friendly Layout for Multiple E-Beam Lithography

3. NTUplace3: An Analytical Placer for Large-Scale Mixed-Size Designs With Preplaced Blocks and Density Constraints

4. Flute: Fast lookup table based technique for rsmt construction and wirelength estimation;chu,0

5. RegularRoute: An Efficient Detailed Router Applying Regular Routing Patterns

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Stitch-avoiding Detailed Routing for Multiple E-Beam Lithography;2022 IFIP/IEEE 30th International Conference on Very Large Scale Integration (VLSI-SoC);2022-10-03

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