World-most energy-efficient MRAM technology for non-volatile RAM applications
Author:
Affiliation:
1. Samsung Electronics Co.,Foundry Business,Giheung,Korea
2. Samsung Electronics Co.,R&D center,Hwasung,Korea
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10019319/10019320/10019430.pdf?arnumber=10019430
Reference4 articles.
1. Low RA Magnetic Tunnel Junction Arrays in Conjunction with Low Switching Current and High Breakdown Voltage for STT-MRAM at 10 nm and Beyond
2. A Study of Write Margin of Spin Torque Transfer Magnetic Random Access Memory Technology;min;IEEE Trans Magn,2010
3. Persistent xSPI STT-MRAM with up to 400MB/s Read and Write Throughput
4. 12.5 Mb/mm2 embedded MRAM for high density non-volatile RAM applications;suh;VLSIT,2021
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