A 1.67Tb, 5b/Cell Flash Memory Fabricated in 192-Layer Floating Gate 3D-nand Technology and Featuring a 23.3 Gb/mm2 Bit Density

Author:

Khakifirooz Ali1ORCID,Anaya Eduardo2,Balasubrahmanyam Sriram2,Bennett Geoff1,Castro Daniel2,Egler John2,Fan Kuangchan2,Ferdous Rifat1ORCID,Ganapathi Kartik1,Guzman Omar2,Ha Chang Wan1,Haque Rezaul2,Harish Vinaya2,Jalalifar Majid2,Jungroth Owen W.2,Kang Sung-Taeg1,Karbasian Golnaz1,Kim Jee-Yeon1,Li Siyue2,Madraswala Aliasgar S.2,Maddukuri Srivijay2,Mohammed Amr1,Mookiah Shanmathi2,Nagabhushan Shashi2,Ngo Binh2,Patel Deep2,Poosarla Sai Kumar2,Prabhu Naveen V.2,Quiroga Carlos2,Rajwade Shantanu1,Rahman Ahsanur2,Shah Jalpa2,Shenoy Rohit S.1,Menson Ebenezer Tachie2,Tankasala Archana1,Thirumala Sandeep Krishna1,Upadhyay Sagar2,Upadhyayula Krishnasree2,Velasco Ashley2,Vemula Nanda Kishore Babu2,Venkataramaiah Bhaskar2,Zhou Jiantao1,Pathak Bharat M.2,Kalavade Pranav1

Affiliation:

1. NAND Design, Technology and Manufacturing, Intel Corporation, Santa Clara, CA, USA

2. NAND Design, Technology and Manufacturing, Intel Corporation, Folsom, CA, USA

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering

Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Data Variability Study of Advanced 3D NAND Memory using Python;2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC);2024-05-13

2. Analytical Modeling of Threshold Voltage and Subthreshold Slope for 3-D NAND Flash Memory With a Non-Uniform Doping Profile;IEEE Journal of the Electron Devices Society;2023

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