A 1.67Tb, 5b/Cell Flash Memory Fabricated in 192-Layer Floating Gate 3D-nand Technology and Featuring a 23.3 Gb/mm2 Bit Density
Author:
Affiliation:
1. NAND Design, Technology and Manufacturing, Intel Corporation, Santa Clara, CA, USA
2. NAND Design, Technology and Manufacturing, Intel Corporation, Folsom, CA, USA
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering
Link
http://xplorestaging.ieee.org/ielx7/8011414/10016898/10149089.pdf?arnumber=10149089
Reference15 articles.
1. Reliability of Solid-State Drives Based on NAND Flash Memory
2. 28.2 A High-Performance 1Tb 3b/Cell 3D-NAND Flash with a 194MB/s Write Throughput on over 300 Layers $\mathsf{i}$
3. A new read method suppressing effect of random telegraph noise in NAND flash memory by using hysteretic characteristic;jeong;Proc Symp VLSI Technol,2013
4. Time dependent threshold-voltage fluctuations in NAND flash memories: From basic physics to impact on array operation
5. 13.2 A 1Tb 4b/Cell 96-Stacked-WL 3D NAND Flash Memory with 30MB/s Program Throughput Using Peripheral Circuit Under Memory Cell Array Technique
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