Optical Wafer Inspection at Advanced Technology Nodes

Author:

Zhu Jinlong1,Liu Jiamin1,Gu Honggang1,Jiang Hao1,Liu Shiyuan1

Affiliation:

1. Huazhong University of Science and Technology,State Key Laboratory of Digital Manufacturing Equipment and Technology,Wuhan,China,430074

Funder

National Natural Science Foundation of China

National Key Research and Development Program of China

National Science and Technology Major Project

Publisher

IEEE

Reference22 articles.

1. Optimizing image-based patterned defect inspection through FDTD simulations at multiple ultraviolet wavelengths;barnes;Modeling Aspects in Optical Metrology VI Proc of SPIE,2013

2. Diffraction phase microscopy: principles and applications in materials and life sciences

3. Extending optical inspection to the VUV;wells;2017 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (FCMN),2017

4. Inspection of IC wafer defects based on image registration;2018 IEEE 3rd Advanced Information Technology Electronic and Automation Control Conference (IAEAC),2018

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