A Study of Deposition/Annealing Cyclic Method to Enhance the Performance of Zinc-Tin Oxide Thin-Film Transistor by Ultrasonic Spray Pyrolysis Deposition
Author:
Affiliation:
1. Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University, Tainan, Taiwan
2. Department of Electrical Engineering, National Sun Yat-Sen University, Kaohsiung, Taiwan
Funder
National Science and Technology Council, Taiwan
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Link
http://xplorestaging.ieee.org/ielx7/16/10457976/10413978.pdf?arnumber=10413978
Reference25 articles.
1. Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors
2. Amorphous Oxide Semiconductors for High-Performance Flexible Thin-Film Transistors
3. Indium Zinc Oxide Nanosheet Transistor With 2 nm Channel Thickness for Monolithic Three-Dimensional Integrated Circuit
4. High performance solution-processed amorphous zinc tin oxide thin film transistor
5. High-Performance Thin Film Transistor with Amorphous In$_{2}$O$_{3}$–SnO$_{2}$–ZnO Channel Layer
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