Optical emission spectroscopy of the plasma during sputter deposition of YBCO films for microwave applications-Reference-Cited by-同舟云学术

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Optical emission spectroscopy of the plasma during sputter deposition of YBCO films for microwave applications

Published:2003-06 Issue:2 Volume:13 Page:2769-2772
ISSN:1051-8223
Container-title:IEEE Transactions on Appiled Superconductivity
language:en
Short-container-title:IEEE Trans. Appl. Supercond.

Author:

Tsaneva V.N.,Nurgaliev T.C.,Donchev T.I.,Vickers M.E.,Durrell J.H.,Purnell A.,Cohen L.F.,Barber Z.H.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx5/77/27269/01212195.pdf?arnumber=1212195

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. X-Ray Diffraction Anomalies and Random Intercalation in H-Loaded Y-Ba-Cu-O Films;IEEE Transactions on Appiled Superconductivity;2005-06

2. Optical emission studies of the plasma during high-pressure sputtering of Y–Ba–Cu–O targets;Vacuum;2004-11

3. Diagnostics of sputtering plasma variations affecting Y–Ba–Cu–O thin film growth and properties;Superconductor Science and Technology;2004-07-02

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