High-speed 850 nm Vertical-cavity Surface-emitting Lasers with Multilayer Oxide Aperture-Reference-Cited by-同舟云学术

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High-speed 850 nm Vertical-cavity Surface-emitting Lasers with Multilayer Oxide Aperture

Published:2022-07-08 Issue: Volume: Page:
ISSN:
Container-title:2022 IEEE 14th International Conference on Advanced Infocomm Technology (ICAIT)
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Author:

Tong Haixia¹,Wei Zhipeng¹,Tong Cunzhu²,Wang Yanjing³,Meng Bo³,Wang Lijun³

Affiliation:

1. Changchun University of Science and Technology,Changchun,China

2. Jlight Semiconductor Technology Co., Ltd,Changchun,China

3. State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics Chinese Academy of Sciences,Changchun,China

Funder

National key research and development program of China

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/9862527/9862604/09862777.pdf?arnumber=9862777

Reference16 articles.

1. Impedance Characteristics and Parasitic Speed Limitations of High-Speed 850-nm VCSELs

2. High Frequency Modeling and Parameter Extraction for Vertical-Cavity Surface Emitting Lasers

3. Small-Signal Analysis of High-Performance VCSELs

4. Impedance Characteristics and Chip-Parasitics Extraction of High-Performance VCSELs

5. Fabrication, performance and parasitic parameter extraction of 850 nm high-speed vertical-cavity lasers

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