Author:
Rosenfield M.G.,Neureuther A.R.
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Cited by
7 articles.
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1. Modeling of exposure and development processes in electron and ion lithography;Modelling and Simulation in Materials Science and Engineering;1994-03-01
2. The Physics of the Interactions between Fast Electrons and Matter;The Physics of Submicron Lithography;1992
3. Resist development simulation treated as a boundary value problem;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1991-05
4. Simulation of electron beam exposure of submicron patterns;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1989-11
5. Monte Carlo Methods and Microlithography Simulation for Electron and X-Ray Beams;Advances in Electronics and Electron Physics Volume 69;1987