Hollow-Cathode CVD $\hbox{N}_{2}$ Plasma Treatment for Performance and Reliability Improvement of LTPS-TFTs
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Published:2012-03
Issue:3
Volume:33
Page:387-389
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ISSN:0741-3106
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Container-title:IEEE Electron Device Letters
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language:
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Short-container-title:IEEE Electron Device Lett.
Author:
Fan Ching-Lin,Lin Yi-Yan,Wang Shou-Kuan
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials