Developments of Basic Researches on Fluorocarbon Plasmas for Material Processing. 4. Production and Loss Processes of Negative Ions.-Reference-Cited by-同舟云学术

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Developments of Basic Researches on Fluorocarbon Plasmas for Material Processing. 4. Production and Loss Processes of Negative Ions.

Published:1999 Issue:7 Volume:75 Page:792-799
ISSN:0918-7928
Container-title:Journal of Plasma and Fusion Research
language:en
Short-container-title:J. Plasma Fusion Res.

Author:

SASAKI Koichi¹,KONO Akihiro²,KADOTA Kiyoshi¹

Affiliation:

1. Department of Electronics,Nagoya University,Nagoya 464-8603,Japan

2. Center for Cooperative Research in Advanced Science and Technology,Nagoya University,Nagoya 464-8603,Japan

Publisher

Japan Society of Plasma Science and Nuclear Fusion Research

Link

http://www.jstage.jst.go.jp/article/jspf/75/7/75_7_792/_pdf

Reference23 articles.

1. Electron attachment to the perfluoroalkanesn‐CNF2N+2(N=1–6) using high pressure swarm techniques

2. Formation of negative ions by electron impact on SiF4 and CF4

3. Electron attachment to the perfluoroalkanes n‐CNF2N+2 (N=1–6) and i‐C4F10 a)

4. Negative‐ion mass spectrometric study of ion‐pair formation in the vacuum ultraviolet. V. CF4→F−+CF+3

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Anion formation by electron impact from CF4;International Journal of Mass Spectrometry;2008-11

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