PERFORMANCE LIMITATIONS OF Si CMOS AND ALTERNATIVES FOR NANOELECTRONICS

Abstract

It is believed that below the 65-nm node although the conventional bulk CMOS can be scaled, however, without appreciable performance gains. To continue the scaling of Si CMOS in the sub-65nm regime, innovative device structures and new materials have to be created in order to continue the historic progress in information processing and transmission. Examples of novel device structures being investigated are double gate or surround gate MOS and examples of novel materials are high mobility channel materials like strained Si and Ge , high-k gate dielectrics and metal gate electrodes. Continuous scaling of VLSI circuits can pose significant problems for interconnects. We show that resistance of interconnect wires in light of scaling induced increase in electron surface scattering, fractional cross section area occupied by the high resistivity barrier and realistic interconnect operation temperature will lead to a significant rise in the effective resistivity of Cu . As a result both power and delay of these interconnects is likely to rise significantly in the future. In the light of various metal interconnect limitations, alternate solutions need to be pursued. We focus on two such solutions, optical interconnects and three-dimensional (3-D) ICs with multiple active Si layers. Heterogeneous integration of the new structures and materials on Si may take us to sub-20 nm regime, but will require new fabrication technology solutions that are generally compatible with current and forecasted installed Si manufacturing.