SPUTTERED TiO2 FILMS FOR PHOTOVOLTAIC CELL'S ANTIREFLECTION COATING

Abstract

TiO2 films were prepared by the magnetron sputter system with various oxygen partial pressure ratios, for the application of photovoltaic (PV) cells, TiO2 single-layer and SiO2/TiO2 double-layer antireflection (AR) coatings were deposited on Si substrate. The experimental results indicate that TiO2 film deposited at oxygen partial pressure ratio of 15.4% exhibits smooth surface morphology, amorphous structure, and good optical transmittance, which is suitable for AR coating in the PV cell structure system. Furthermore, the weighted average reflectance in the range of 400–900 nm was about 10.3% and 3.7% for the TiO2 single-layer and SiO2/TiO2 double-layer AR coatings, respectively. With a double-layer AR coating, a 50.8% improvement in the efficiency of a Si PV cell was achieved.