The influence of precursor gas pressure on structure and properties of fluoropolymer coatings by hot wire CVD
Author:
Publisher
EDP Sciences
Link
http://www.epj-conferences.org/10.1051/epjconf/201715900042/pdf
Reference7 articles.
1. Yasuda H. Plasma Polymerization. (Academic Press, 1985)
2. Ultrathin Fluoropolymer Films Deposited on a Polyimide (Kapton®) Surface by RF Magnetron Sputtering of Poly(tetrafluoroethylene)
3. Structure and Morphology of Fluorocarbon Films Grown by Hot Filament Chemical Vapor Deposition
4. Hot-wire chemical vapor deposition (HWCVD) of fluorocarbon and organosilicon thin films
5. Depositing films from a supersonic jet of tetrafluoroethylene activated by interaction with a hot wire obstacle
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Redox-active fluoropolymers;Fascinating Fluoropolymers and Their Applications;2020
2. Influence of Precursor Gas Flow Rate on Fluoropolymer Coating Growth Rate During Hot Wire Chemical Vapor Deposition;Journal of Applied Mechanics and Technical Physics;2018-09
3. Deposition features and wettability behavior of fluoropolymer coatings from hexafluoropropylene oxide activated by NiCr wire;Thin Solid Films;2018-05
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