Negative Thermal Expansion of Sulphur-Doped Graphene Oxide

Author:

Figarova Sophia1,Aliyev Elvin2,Abaszade Reshad3,Figarov Vagif R.4

Affiliation:

1. Baku State University

2. University of Birmingham

3. Azerbaijan State Oil and Industry University

4. Institute of Physics

Abstract

The sulfur content present in graphene oxide prepared by Hummers' method has only been addressed by few papers so far. By modified Hammers method we synthesized thermally stable in ambient environment multilayer sulphur-doped graphene oxide. The samples were heat treated in an electrical furnace setup at different ambient temperatures and their crystallite size and linear coefficient of thermal expansion were extracted from Raman band intensity peak ratio as a function of temperature. We found unusually large (in comparison with graphene oxide) contraction on heating of multilayer two weight percent sulphur-doped graphene oxide with carbon to oxygen ratio of 2.3 in a narrow temperature range (308-318 K) with the lowest value of the linear thermal expansion coefficient of -18 ppm 1/K. Based upon an examination of the synthesized sulphur-doped graphene diffractograms, it is suggested that negative thermal expansion stems from the phonon backscattering by the sulphur impurity sites and the edges of the layers. The obtained experimental results have potential practical applications for fabrication of solar cells, sensors, lubricators, thermal actuators and also wavelike (second sound) thermal transport structures.

Publisher

Trans Tech Publications, Ltd.

Subject

General Engineering

Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3