Surface Roughness Control of Zirconia Films Using a Novel Photoresponsive Precursor Molecule for Improving its Photocatalytic Activity
-
Published:2008-01
Issue:
Volume:569
Page:13-16
-
ISSN:1662-9752
-
Container-title:Materials Science Forum
-
language:
-
Short-container-title:MSF
Author:
Nishizawa Kaori1,
Miki Takeshi1,
Watanabe Eiji1,
Taoda Hiroshi1
Affiliation:
1. National Institute of Advanced Industrial Science and Technology (AIST)
Abstract
A novel photoresponsive zirconia (ZrO2) precursor solution was prepared using
zirconium tetra-n-butoxide, 4-(phenylazo)benzoic acid and ethyleneglycol monomethylether. Two
kinds of ZrO2 films were prepared using the photoresponsive ZrO2 precursor solution and by
dip-coating while applying an electric field to the substrates: one was the film prepared with
ultraviolet (UV) irradiation to the solution and as-deposited films; the other was the film prepared
without UV irradiation. It was found that the surface roughness of films was greatly changed by UV
irradiation. Furthermore, the photocatalytic activity of the rough film was greater than that of the
smooth film.
Publisher
Trans Tech Publications, Ltd.
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference10 articles.
1. H. S. Choi, E. H. Kim, I. H. Choi, Y. T. Kim, J. H. Choi and J. Y. Lee, Thin Solid Films, 388, 2001, p.226.
2. C. M. Perkins, B. B. Triplett, P. C. Mclntyre, K. C. Saraswat, S. Haukka and M. Tuominen, Appl. Phys. Lett., 78.
3. 2001, p.2357.
4. G. L. Tan and X. J. Wu, Thin Solid Films, 330, 1998, p.59.
5. K. Sayama and H. Arakawa, J. Phys. Chem., 97.