ZrO2 Thin Films Prepared by Self-Assembled Method

Abstract

Octadecyltrichlorosilane (OTS) was prepared on glass substrate to form self-assembled monolayer (OTS-SAM). The OTS-SAM was then UV-irradiated to endow the film with good chemisorption ability. Zirconia films were formed on silanol SAM by the LPD method. The phase structure and surface configuration of the zirconia films were studied by XRD and SEM respectively. The XRD results indicate that the as-deposited ZrO2 thin films are pure tetragonal phase after being annealed at 500°C for 1 h. SEM images show the zirconia film is uniform, but not very compacted.