Preparation and its Silica Wafer CMP Performance of Cationic Polyelectrolyte Modified Benzoguanamine Formaldehyde/SiO<sub>2</sub> Composite Abrasives Slurry-Reference-Cited by-同舟云学术

Preparation and its Silica Wafer CMP Performance of Cationic Polyelectrolyte Modified Benzoguanamine Formaldehyde/SiO₂ Composite Abrasives Slurry

Published:2011-02 Issue: Volume:189-193 Page:4158-4162
ISSN:1662-8985
Container-title:Advanced Materials Research
language:
Short-container-title:AMR

Author:

Xu Xue Feng¹,Zhao Bin Shan¹,Yang Yu Zhi¹,Guo Quan¹,Peng Wei¹

Affiliation:

1. Zhejiang University of Technology

Abstract

In this paper, the adsorption characteristics of cationic polyelectrolyte PDADMAC on BGF particles and Zeta potential of BGF particles have been investigated. A new type of composite abrasive slurry was obtained with cationic polyelectrolyte modified BGF particles and its polishing performance was studied. Experimental results showed that the Zeta potential of the modified BGF particles was changed from negative to positive and the maximum value (+35mv) was obtained when the adsorption saturation was achieved, and the adsorption capacity of SiO2 abrasives on BGF particles was improved significantly as well. The material removal rate was 469nm/min with the modified BGF/ SiO2 composite abrasives slurry containing 5% SiO2 and 3% modified BGF particles, increasing by 47% and 89% than those of the unmodified BGF/SiO2 composite abrasives slurry (319nm/min) and the single silica abrasives slurry (248nm/min), respectively.

Publisher

Trans Tech Publications, Ltd.

Subject

General Engineering

Link

https://www.scientific.net/AMR.189-193.4158.pdf

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