Characterization of 100 mm Diameter 4H-Silicon Carbide Crystals with Extremely Low Basal Plane Dislocation Density

Author:

Dudley Michael1,Zhang Ning2,Zhang Yu2,Raghothamachar Balaji1,Byrapa Sha Yan1,Choi Gloria1,Sanchez Edward K.3,Hansen Darren M.3,Drachev Roman3,Loboda Mark J.3

Affiliation:

1. Stony Brook University

2. State University of New York at Stony Brook

3. Dow Corning Compound Semiconductor Solutions

Abstract

Synchrotron White Beam X-ray Topography (SWBXT) studies are presented of basal plane dislocation (BPD) configurations and behavior in a new generation of 100mm diameter, 4H-SiC wafers with extremely low BPD densities (3-4 x 102 cm-2). The conversion of non-screw oriented, glissile BPDs into sessile threading edge dislocations (TEDs) is observed to provide pinning points for the operation of single ended Frank-Read sources. In some regions, once converted TEDs are observed to re-convert back into BPDs in a repetitive process which provides multiple BPD pinning points.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

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