Preparation and Conductive Properties of Ag Thin Film by DC Magnetron Sputtering Method-Reference-Cited by-同舟云学术

Preparation and Conductive Properties of Ag Thin Film by DC Magnetron Sputtering Method

Published:2012-11 Issue: Volume:217-219 Page:1068-1072
ISSN:1662-7482
Container-title:Applied Mechanics and Materials
language:
Short-container-title:AMM

Author:

Lin Jian Guang¹,Weng Wei Xiang¹,Huang Wei Hui¹,Zhou Hai Fang¹

Affiliation:

1. Fuzhou University

Abstract

Ag thin films were prepared on the float-glass substrate by DC magnetron sputtering method. The relationship of surface morphology/electrical properties with technical conditions was investigated. The experimental results showed that sputtering power, sputtering pressure and substrate temperature had effects on the morphology and electrical properties of Ag thin films. The optimum parameters were obtained with sputtering power of 100 W，sputtering pressure of 0.4 Pa and substrate temperature of 130 °C. Under the optimum parameters, the deposited Ag thin film was smooth and its resistivity was as low as 1.96×10-8 Ω•m.

Publisher

Trans Tech Publications, Ltd.

Link

https://www.scientific.net/AMM.217-219.1068.pdf

Reference10 articles.

1. Peifu Gu: Modern Optical Thin Film Technology (Hangzhou: Zhejiang University Press. China 2006).

2. K. Y. Ban, H.G. Hong, D.Y. Noh, J. I. Sohn, D. J. Kang and T. Y. Seong: Mater. Sci. Eng. B Vol. 133 (2006), pp.26-29.

3. Yuwang Yang and Jingli Liu: Industrial Catalysis Vol. 11(12) (2003), pp.7-12 (in Chinese).

4. Fuzhen Wang and Wencun Ma: Vapor deposition application technology (Beijing: China Machine Press. China 2007).

5. Zhentao Li, Zhenjian Wang and Daqing Zhao: Acta Energiae Solaris Sinica. Vol. 25(6) (2004), pp.811-815. (in Chinese).