Affiliation:
1. TU Dresden
2. Institute of Physics CAS
3. National University of Science and Technology “MISIS"
Abstract
Large area film deposition was performed by means of multitarget reactive magnetron sputtering from metallic targets (Pb, Ti, Zr) with a diameter of 200 mm onto Cu-coated Kapton® HN substrates. High-power pulse sputtering has been employed for the Zr-target (or alternatively for the Ti-target). Film composition profiles were evaluated by XPS and RBS. Piezoelectric properties were investigated by PFM.
Publisher
Trans Tech Publications, Ltd.
Subject
Condensed Matter Physics,General Materials Science,Atomic and Molecular Physics, and Optics