Study of Biopolymer Chitosan as Resist for Submicron Electronic Lithography

Abstract

This paper presents the results of the study of polysaccharide chitosan as a new resist for electronic lithography for direct formation of mesostructures in submicron range. Film-forming properties of chitosan allow enough simply to obtain coatings with a thickness of tens to hundreds of nanometers. Furthermore, the optical and sensor characteristics of the films of various ionic forms of chitosan are well investigated, so it makes possible to form on their basis integrally optical functional structures.