Research on the Raman Spectrum of the MPCVD Diamond Films

Abstract

This research took CH4 and H2 as the air source and sufficiently utilized the diamond films generated on the Si piece due to the microwave plasma chemical vapor deposition (MPCVD) method. Raman spectrum functioned as the key method to investigate the diamond films in such research. The diamond phase, large graphite monocrystals and the disorderly graphite in the films were related respectively to different Raman characteristic peaks. An analysis and related investigation on the Raman spectrum of the sample revealed the performance parameters of the structure, purity and stress of the diamond films in different concentrations of the air source.