Affiliation:
1. Tohoku University
2. Institute for Materials Research
Abstract
α-Al2O3 and α-Al2O3/TiN multilayer films were prepared on Ti(C,N)-based cermet substrate by laser chemical vapor deposition.α-Al2O3 and NaCl-type TiN films were prepared at Tdep = 1148 K. α-Al2O3/TiN multilayer film showed dense structure of cross section, and its surface morphology consisted of aggregated spherical grains. The adhesion of α-Al2O3/TiN multilayer film prepared on Ti(C,N)-based cermet was higher as compared with α-Al2O3 film directly prepared on the cermet.
Publisher
Trans Tech Publications, Ltd.
Subject
Mechanical Engineering,Mechanics of Materials,General Materials Science
Cited by
3 articles.
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