An Improved Edge Extraction Algorithm for Lithography Micrographs

Abstract

For shape error analysis and correction of micro-structure in lithography, image edges should be extracted from micrographs of the structures. First several basic image edge detection algorithms are analyzed and compared. Then according to the unique conditions of micrographs in lithography experiments, an improved image edge extraction method is investigated. In this method Canny operator is selected as a basic algorithm, while the mathematical morphology is used in pre-processing for de-noising to reduce the uneven phenomenon. And an appropriate enhancement algorithm is used to enhance image contrast. Experimental results show that this method can extract the image edge from the micro-structure graphs effectively.