Affiliation:
1. National Institute of Advanced Industrial Science and Technology (AIST)
2. Nagoya University
3. Advanced Industrial Science and Technology AIST
Abstract
A new photochromic ZrO2 precursor solution was prepared using zirconium tetra-n-butoxide,
4-(phenylazo)benzoic acid and ethyleneglycol monomethylether. The density functional theory
(DFT) calculation has identified that the structure of the synthesized precursor molecule changed by
UV irradiation. The two kinds of thin films were prepared using the photosensitive ZrO2 precursor
solution without and with UV irradiation. The surface morphology of thin films changed by UV
irradiation. It was found that the surface morphology of thin films is controlled by the difference of
precursor structure introduced by UV irradiation.
Publisher
Trans Tech Publications, Ltd.
Subject
Mechanical Engineering,Mechanics of Materials,General Materials Science
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