Research on Chemical Mechanical Polishing Technology of SiC Mirror-Reference-Cited by-同舟云学术

Research on Chemical Mechanical Polishing Technology of SiC Mirror

Published:2013-05 Issue: Volume:552 Page:168-173
ISSN:1662-9795
Container-title:Key Engineering Materials
language:
Short-container-title:KEM

Author:

Ma Zhen Fang¹,Dong Lian He²,Sun Yan Jun¹,Leng Yan Bing¹,Chen Zhe¹

Affiliation:

1. Changchun University of Science and Technology

2. Changchun University of Science and Technology 7089 Weixing Road, Changchun, Jilin, P.R.China 130022

Abstract

This paper makes an researches on high precision polishing process of SiC mirror by using mechanical and chemical polishing combined methods. The chemical compositions, mechanical characteristics of SiC and the factors which affect the polishing precision and quality are analyzed. Also, the components of polishing liquid, polishing pad and the pressure of the millstone are also optimized. Then the author polishes a 220mm diameter SiC mirror which the roughness is less than 1 nm. The results show that the combination of chemical and mechanical polishing can overcome the traditional shortcomings of mechanical polishing and chemical etching method, improve the removal rate, further improve the polishing surface roughness, get the small surface damage layer and high integrity of smooth surfaces.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Link

https://www.scientific.net/KEM.552.168.pdf

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