Growth of Orientation-Controlled Epitaxial KNbO3 Thin Film by Hydrothermal Method

Author:

Einishi Hiro1,Ishikawa Mutsuo1,Nakajima Mitsumasa1,Yasui Sintaro1,Yamada Tomoaki1,Kurosawa Minoru1,Funakubo Hiroshi1

Affiliation:

1. Tokyo Institute of Technology

Abstract

KNbO3 thin films were deposited at 240 oC on various kinds of single crystal substrates by hydrothermal method using aqueous solutions containing Nb2O5 and KOH. The deposition amount of the films was found not to be much dependent on the orientation and the surface roughness of the substrates, but on the electrical conductivity of the substrate. Epitaxial {100}, {110} and {111}-oriented KNbO3 films with ferroelectricity were grown on (100)c, (110)c, and (111)c -oriented SrRuO3//(100)SrTiO3 substrates, respectively.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

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