Growth of 3-inch Diameter 6H-SiC Single Crystals by Sublimation Physical Vapor Transport
Author:
Affiliation:
1. Beihang University
2. Dow Corning Corporation
3. Sterling Semiconductor Inc.
4. Sterling Semiconductor, Inc
Publisher
Trans Tech Publications, Ltd.
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Link
https://www.scientific.net/MSF.389-393.35.pdf
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Nondestructive three-dimensional observation of defects in semi-insulating 6H-SiC single-crystal wafers using a scanning laser microscope (SLM) and infrared light-scattering tomography (IR-LST);Journal of Crystal Growth;2009-07
2. Defect Distribution in N-Doped and Semi-Insulating 6H-SiC Bulk Single Crystal Wafers Observed by Two- and Three-Dimensional Light Scattering Tomography;Japanese Journal of Applied Physics;2008-07-11
3. Transient numerical study of temperature gradients during sublimation growth of SiC: Dependence on apparatus design;Journal of Crystal Growth;2006-12
4. Radial Expansion Growth of SiC Single Crystals with Higher Crystal Quality;Materials Science Forum;2004-06
5. Continuous Feed Physical Vapor Transport;Journal of The Electrochemical Society;2003
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