Fabrication of Mg<sub>2</sub>Si pn-junction photodiode with shallow mesa-structure and ring electrode
Author:
Affiliation:
1. Graduate School of Science and Engineering, Ibaraki University, Hitachi, Ibaraki 316-8511, Japan
2. National Institute for Materials Science, Tsukuba, Ibaraki 305-0047, Japan
Publisher
The Japan Society of Applied Physics
Link
https://www.jstage.jst.go.jp/article/jjapcp/5/0/5_011102/_pdf
Reference12 articles.
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3. H. Udono, H. Tajima, M. Uchikoshi, and M. Itakura, Jpn. J. Appl. Phys. 54, 07JB06 (2015). https://doi.org/10.7567/JJAP.54.07JB06
4. D. Tamura, R. Nagai, K. Sugimoto, H. Udono, I. Kikuma, H. Tajima, and I. J. Ohsugi, Thin Solid Films 515, 8272 (2007). https://doi.org/10.1016/j.tsf.2007.02.065
5. H. Udono, Y. Yamanaka, M. Uchikoshi, and M. Isshiki, J. Phys. Chem. Solids 74, 311 (2013). https://doi.org/10.1016/j.jpcs.2012.10.005
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